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Method of Polymethylmethacrylate (PMMA) Removal from a Graphene Surface by Photoexposure

Method of Polymethylmethacrylate (PMMA) Removal from a Graphene Surface by Photoexposure

Patent: EP 3840050 B1
Authors: Natalia Alexeeva, Irmantas Kašalynas

Description: The method removes PMMA layers from graphene surfaces through DUV exposure and alcohol/water development while preserving graphene integrity.

State Research Institute Center for
Physical Sciences and Technology
Public institution
Code 302496128
VAT code LT100005300110

Savanorių st. 231, LT-02300 Vilnius
+370 645 15550
info@ftmc.lt

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