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Method Of Polymethylmethacrylate (PMMA) Removal From A Graphene Surface By Photoexposure

Method Of Polymethylmethacrylate (PMMA) Removal From A Graphene Surface By Photoexposure

Patent: EP 3936476 B1
Authors: Natalia Alexeeva, Irmantas Kašalynas

Description: The invention relates to removal of polymethylmethacrylate (PMMA) from graphene surfaces using deep ultraviolet (DUV) photoexposure and alcohol/water development. The method enables efficient cleaning of graphene while preserving its structural integrity and electronic properties.

State Research Institute Center for
Physical Sciences and Technology
Public institution
Code 302496128
VAT code LT100005300110

Savanorių st. 231, LT-02300 Vilnius
+370 645 15550
info@ftmc.lt

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