Method of Polymethylmethacrylate (PMMA) Removal from Graphene Surface by Photoexposure

  • Patent: LT 6888 B
  • Authors: Natalia Alexeeva, Irmantas Kašalynas

Description: The method enables removal of PMMA from graphene surfaces using deep ultraviolet (DUV) photoexposure followed by development in an alcohol/water mixture.