Method of Polymethylmethacrylate (PMMA) Removal from Graphene Surface by Photoexposure
Method of Polymethylmethacrylate (PMMA) Removal from Graphene Surface by Photoexposure
Patent: LT 6888 B
Authors: Natalia Alexeeva, Irmantas Kašalynas
Description: The method enables removal of PMMA from graphene surfaces using deep ultraviolet (DUV) photoexposure followed by development in an alcohol/water mixture.
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